Chemical Processing of Dielectrics, Insulators and Electronic Ceramics: Volume 606 (Paperback)

This book focuses on the creative use of chemistry in the fabrication of a variety of oxide and non-oxide materials which are likely to play a crucial role in the development of the next generation of microelectronics devices. It includes inorganic precursor chemistry, gas-phase and solid-state chemistry, materials science, chemical physics and chemical engineering. Highlights include the deposition of high-k dielectric gate oxides, ferroelectric oxide films for infrared and memory applications, low-k dielectrics, TiN and TaN diffusion barriers, and fresh precursors for III-V nitrides. The emphasis is on chemical methods for the controlled deposition of thin films, for which chemical vapor deposition (CVD) has proven to be a useful and versatile technique. Of particular interest is the use of liquid-injection MOCVD for the deposition of oxide multilayers and superlattices. Solution deposition techniques such as sol-gel, metalorganic decomposition (MOD), hydrothermal processing are also prominently featured. Topics include: CVD of oxide ceramics; CVD of nonoxide ceramics; solution deposition of electronic ceramics; alternative chemical processing methods and characterization of electronic ceramics..

General

Imprint:	Cambridge UniversityPress
Country of origin:	United Kingdom
Series:	MRS Proceedings
Release date:	June 2014
First published:	November 2012
Editors:	Anthony C. Jones • Janice Veteran • Donald Mullin • Reid Cooper • Sanjeev Kaushal
Dimensions:	229 x 152 x 17mm (L x W x T)
Format:	Paperback - Trade
Pages:	328
ISBN-13:	978-1-107-41320-7
Categories:	Books > Professional & Technical > Industrial chemistry & manufacturing technologies > Industrial chemistry > Ceramics & glass technology Books > Professional & Technical > Mechanical engineering & materials > Materials science > General Promotions
LSN:	1-107-41320-6
Barcode:	9781107413207

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