Of related interest...

LASER IONIZATION MASS ANALYSIS

Edited by Akos Vertes, Renaat Gijbels, and Fred Adams

Edited by three of the field's leading authorities and featuring contributions from thirteen chemists, this book offers a comprehensive look at the new hardware and investigative possibilities of this form of analysis. The book clearly links theory with applications as well as hardware with hard science. Among topics covered are lasers in mass spectrometry, including instrumentation basic to ion generation for mass analysis; methods of using low and medium laser irradiance; high laser irradiance regime; exotic applications of laser ionization mass spectrometry in space research. 1993 (0-471-53673-3) 584 pp.

STATISTICAL METHODS IN ANALYTICAL CHEMISTRY —Peter C. Meier and Richard E. Zünd

Designed to address the practical day-to-day needs of lab chemists, this practical guide demonstrates the ways in which statistics can be used effectively in analytical work. Chapters 1 and 2 present classical statistical techniques, illustrating them in the context of simple situations. Chapter 3 expands the discussion into ancillary techniques, such as exploratory data analysis, made possible with computing. Chapter 4 presents a number of complex examples that might confront the analyst, while emphasizing the conflicting demands imposed on a possible solution. Chapter 5 presents core sections of programs which complement the equations. Complete with a floppy disk of ready-made programs and data files, here is a clear, real-world introduction to maximizing statistical tools in the lab. 1993 (0-471-58454-1) 352 pp.

PHOTOCHEMICAL VAPOR DEPOSITION—J. G. Eden

Here is an extremely useful overview of photochemical vapor deposition, both its characteristics and potential. The book focuses on the properties of films that have been created by this versatile method and the conditions under which they are grown. The author works from the position that while photochemical vapor deposition (photo-CVD) is not the solution to all low-temperature deposition methodologies, it does provide an added dimension of flexibility to and control over the growth process and has proven to be valuable for those materials and growth steps in device fabrication that are sensitive to the processing temperature. Whenever applicable, the properties of electronic devices incorporating photo-CVD films are presented and numerous tables detail the deposition parameters as well as electrical and structural properties of the films of specific materials. 1992 (0-471-55083-3) 208 pp.

Research and development of solid state gas sensor devices began in the 1950s with several uncoordinated independent efforts. The number and pace of these investigations later accelerated in response to increasing pressure placed on the environment and public health by industrial activities. Since 1970, several thousand articles have been written on the subject, and laboratories around the globe have introduced novel methodologies and devices to address needs associated with particular technological developments. Despite the rapid development of this important new technology, very little has been done to review and coordinate data related to sensor science and technology itself.

Physics, Chemistry and Technology of Solid State Gas Sensor Devices focuses on the underlying principles of solid state sensor operation and reveals the rich fabric of interdisciplinary science that governs modern sensing devices. Beginning with some historical and scientific background, the text proceeds to a study of the interactions of gases with surfaces. Subsequent chapters present detailed information on the fabrication, performance, and application of a variety of sensors.

Types of sensor devices discussed include:

• Gas-sensitive solid state semiconductor sensors
• Photonic and photoacoustic gas sensors
• Fiber optic sensors
• Piezoelectric quartz crystal microbalance sensors
• Surface acoustic wave sensors
• Pyroelectric and thermal sensors

For analytical chemists using solid state sensors in environment-related analysis, and for electrical engineers working with solid state sensors, this book will expand and unify their understanding of these devices, both in theory and practice.

Review articles by leading scientists in their fields are brought together in this volume to provide a comprehensive treatment of photoacoustic, photothermal and photochemical processes at surfaces and in thin films. The articles introduce the fields, review present knowledge and conclude with latest developments and future prospects. Topics covered include laser-induced desorption, ablation and surface damage; surface acoustic waves; photothermal and photoacoustic characterization of thin films and interfaces; depth profiling in the frequency and time domains; remote testing and nondestructive evaluation; materials characterization; and new theoretical approaches using fractals. The book will interest newcomers to photoacoustics, since it gives an overview of current research and details of experimental methods. It will also be a source of information for those already in the field due to its clear presentation of theory and experimental results. All relevant literature references in this rapidly expanding field are included.