Design for Manufacturability with Advanced Lithography (Paperback, Softcover reprint of the original 1st ed. 2016)

This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms.

General

Imprint:	Springer International Publishing AG
Country of origin:	Switzerland
Release date:	August 2016
First published:	2016
Authors:	Bei Yu • David Z. Pan
Dimensions:	235 x 155mm (L x W)
Format:	Paperback
Pages:	164
Edition:	Softcover reprint of the original 1st ed. 2016
ISBN-13:	978-3-319-37393-5
Categories:	Books > Professional & Technical > Electronics & communications engineering > Electronics engineering > Circuits & components Books > Computing & IT > Computer hardware & operating systems > Computer architecture & logic design > General
LSN:	3-319-37393-5
Barcode:	9783319373935

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