Design for Manufacturability and Yield for Nano-Scale CMOS (Hardcover, 2007 ed.)

This book walks the reader through all the aspects of manufacturability and yield in a nano-CMOS process and how to address each aspect at the proper design step starting with the design and layout of standard cells and how to yield-grade libraries for critical area and lithography artifacts through place and route, CMP model based simulation and dummy-fill insertion, mask planning, simulation and manufacturing, and through statistical design and statistical timing closure of the design. It alerts the designer to the pitfalls to watch for and to the good practices that can enhance a design's manufacturability and yield. This book is a must read book the serious practicing IC designer and an excellent primer for any graduate student intent on having a career in IC design or in EDA tool development.

General

Imprint:	Springer-Verlag New York
Country of origin:	United States
Series:	Integrated Circuits and Systems
Release date:	July 2007
First published:	July 2007
Authors:	Charles Chiang • Jamil Kawa
Dimensions:	235 x 155 x 18mm (L x W x T)
Format:	Hardcover
Pages:	255
Edition:	2007 ed.
ISBN-13:	978-1-4020-5187-6
Categories:	Books > Professional & Technical > Electronics & communications engineering > Electronics engineering > Circuits & components Promotions
LSN:	1-4020-5187-5
Barcode:	9781402051876

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