High Power Impulse Magnetron Sputtering - Fundamentals, Technologies, Challenges and Applications (Paperback)

High Power Impulse Magnetron Sputtering: Fundamentals, Technologies, Challenges and Applications is an in-depth introduction to HiPIMS that emphasizes how this novel sputtering technique differs from conventional magnetron processes in terms of both discharge physics and the resulting thin film characteristics. Ionization of sputtered atoms is discussed in detail for various target materials. In addition, the role of self-sputtering, secondary electron emission and the importance of controlling the process gas dynamics, both inert and reactive gases, are examined in detail with an aim to generate stable HiPIMS processes. Lastly, the book also looks at how to characterize the HiPIMS discharge, including essential diagnostic equipment. Experimental results and simulations based on industrially relevant material systems are used to illustrate mechanisms controlling nucleation kinetics, column formation and microstructure evolution.

General

Imprint:	Elsevier Science Publishing Co Inc
Country of origin:	United States
Release date:	August 2019
First published:	2020
Editors:	Daniel Lundin • Tiberiu Minea • Jon Tomas Gudmundsson
Dimensions:	229 x 152 x 22mm (L x W x T)
Format:	Paperback
Pages:	398
ISBN-13:	978-0-12-812454-3
Categories:	Books > Professional & Technical > Mechanical engineering & materials > Materials science > General Promotions
LSN:	0-12-812454-7
Barcode:	9780128124543

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