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Dry Etching Technology for Semiconductors (Paperback, Softcover reprint of the original 1st ed. 2015)
Loot Price: R3,116
Discovery Miles 31 160
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Dry Etching Technology for Semiconductors (Paperback, Softcover reprint of the original 1st ed. 2015)
Expected to ship within 10 - 15 working days
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This book is a must-have reference to dry etching technology for
semiconductors, which will enable engineers to develop new etching
processes for further miniaturization and integration of
semiconductor integrated circuits. The author describes the
device manufacturing flow, and explains in which part of the flow
dry etching is actually used. The content is designed as a
practical guide for engineers working at chip makers, equipment
suppliers and materials suppliers, and university students studying
plasma, focusing on the topics they need most, such as detailed
etching processes for each material (Si, SiO2, Metal etc) used in
semiconductor devices, etching equipment used in manufacturing
fabs, explanation of why a particular plasma source and gas
chemistry are used for the etching of each material, and how to
develop etching processes. The latest, key technologies are
also described, such as 3D IC Etching, Dual Damascene Etching,
Low-k Etching, Hi-k/Metal Gate Etching, FinFET Etching, Double
Patterning etc.
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