Books > Professional & Technical > Electronics & communications engineering > Electronics engineering > Electronic devices & materials > Semi-conductors & super-conductors
|
Buy Now
Dry Etching Technology for Semiconductors (Paperback, Softcover reprint of the original 1st ed. 2015)
Loot Price: R3,357
Discovery Miles 33 570
|
|
Dry Etching Technology for Semiconductors (Paperback, Softcover reprint of the original 1st ed. 2015)
Expected to ship within 10 - 15 working days
|
This book is a must-have reference to dry etching technology for
semiconductors, which will enable engineers to develop new etching
processes for further miniaturization and integration of
semiconductor integrated circuits. The author describes the
device manufacturing flow, and explains in which part of the flow
dry etching is actually used. The content is designed as a
practical guide for engineers working at chip makers, equipment
suppliers and materials suppliers, and university students studying
plasma, focusing on the topics they need most, such as detailed
etching processes for each material (Si, SiO2, Metal etc) used in
semiconductor devices, etching equipment used in manufacturing
fabs, explanation of why a particular plasma source and gas
chemistry are used for the etching of each material, and how to
develop etching processes. The latest, key technologies are
also described, such as 3D IC Etching, Dual Damascene Etching,
Low-k Etching, Hi-k/Metal Gate Etching, FinFET Etching, Double
Patterning etc.
General
Is the information for this product incomplete, wrong or inappropriate?
Let us know about it.
Does this product have an incorrect or missing image?
Send us a new image.
Is this product missing categories?
Add more categories.
Review This Product
No reviews yet - be the first to create one!
|
|
Email address subscribed successfully.
A activation email has been sent to you.
Please click the link in that email to activate your subscription.