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Interconnect Noise Optimization in Nanometer Technologies (Hardcover, 2006 ed.)
Loot Price: R2,927
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Interconnect Noise Optimization in Nanometer Technologies (Hardcover, 2006 ed.)
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Interconnect has become the dominating factor in determining system
performance in nanometer technologies. This book is dedicated to
this important subject. The primary purpose of this monograph is to
provide insight and intuition into layout analysis and optimization
for interconnect in high speed, high complexity integrated
circuits. In this monograph, the effects of wire size, spacing
between wires, wire length, coupling length, load capacitance, rise
time of the inputs, place of overlap (near driver or receiver
side), frequency, shields, direction of the signals, and wire width
for both the aggressors and the victim wires on system performance
and reliability is thoroughly investigated. Also, parameters like
driver strength has been considered as several recent studies
considered the simultaneous device and interconnect sizing.
Crosstalk noise, as well as the impact of coupling on aggressor
delay is analyzed. The pulse width of the crosstalk noise, which is
of similar importance for circuit performance as the peak
amplitude, is also analyzed. We have considered more parameters
that can affect the signal integrity and presented a practical
intensive simulation results. throughout the literature, presenting
a range of CAD algorithms and techniques for synthesizing and
optimizing interconnect. The practical aspects of the algorithms
and models are explained with sufficient detail. It deeply
investigates the most two effective parameters in layout
optimization, spacing and shield insertion, that can affect both
capacitive and inductive noise. Noise models needed for layouts
with multi-layer multi-crosscoupling segments are investigated.
Different post-layout optimization techniques are explained with
complexity analysis and benchmarks tests are provided.
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