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Properties of Tunnel Junctions with Fluorocarbon Dielectric Barriers (Paperback)
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Properties of Tunnel Junctions with Fluorocarbon Dielectric Barriers (Paperback)
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Thesis. The electrical characteristics of In/I/In and In/I/Pb
superconducting tunnel junctions have been studied in detail. Since
In does not readily form pinhole free oxide layers, a thin
insulating dielectric was formed on freshly deposited In film by
passing an electric discharge through an atmosphere of fluorocarbon
gas. Junctions were then completed by depositing a thin counter
electrode of In or Pb. The same process was used to prepare high
resistance junctions with Au as the base electrode; these were not
however, studied in detail. In/I/In and In/I/Pb junctions were
produced with resistances in the range 0.01 ohms to 10/sup 10/ ohms
at liquid helium temperatures. Low resistance junctions exhibited
nonlinear electrical characteristics associated with good quality
oxide'' superconducting junctions including (a) the dc Josephson
effcct, (b) quasiparticle tunneling characteristics. (c) phonon
structure and (d) inelastic tunneling phenomena. The magnitude of
the Josephson current for In/I/In junctions agreed to within a few
percent of the value predicted by strong coupling theory. Current
voltage (I-V) and first and second derivative curves for In/I/In
and In/I/Pb were compared with curves for Al/I/In and Pb/I/Pb
junctions. Discrepancies between the characteristics can be, for
the most part, explained on the basis of existing theories of
phonon mediated superconductivity using recent data from inelastic
neutron scattering studies of In. Nonlinear structure at voltages
below the phonon spectrum was observed and is most likely
associated with Kohn singularities. At higher voltages, second
derivative curves exhibited resonances characteristic of CH and OH
impurities in the barrier as well as a complex spectrum associated
with the vibrational spectrum of the fluorocarbon dielectric. To
better characterize this dielectric, a variety of surface analytic
techniques were used to determine the complex index of refraction,
the chemical composition and chemical homogeneity of the barrier.
I-V curves for high resistance junctions were used to determine the
potential at the metal-insulator interface.
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