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Plasma Processes for Semiconductor Fabrication (Paperback, Revised)
Loot Price: R2,182
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Plasma Processes for Semiconductor Fabrication (Paperback, Revised)
Series: Cambridge Studies in Semiconductor Physics and Microelectronic Engineering
Expected to ship within 12 - 19 working days
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Plasma processing is a central technique in the fabrication of
semiconductor devices. This self-contained book provides an
up-to-date description of plasma etching and deposition in
semiconductor fabrication. It presents the basic physics and
chemistry of these processes, and shows how they can be accurately
modeled. The author begins with an overview of plasma reactors and
discusses the various models for understanding plasma processes. He
then covers plasma chemistry, addressing the effects of different
chemicals on the features being etched. Having presented the
relevant background material, he then describes in detail the
modeling of complex plasma systems, with reference to experimental
results. The book closes with a useful glossary of technical terms.
No prior knowledge of plasma physics is assumed in the book. It
contains many homework exercises and serves as an ideal
introduction to plasma processing and technology for graduate
students of electrical engineering and materials science. It will
also be a useful reference for practicing engineers in the
semiconductor industry.
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