Developments in Surface Contamination and Cleaning: Applications of Cleaning Techniques, Volume Eleven, part of the Developments in Surface Contamination and Cleaning series, provides a guide to recent advances in the application of cleaning techniques for the removal of surface contamination in various industries, such as aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography. The material in this new edition compiles cleaning applications into one easy reference that has been fully updated to incorporate new applications and techniques. Taken as a whole, the series forms a unique reference for professionals and academics working in the area of surface contamination and cleaning.

Surfactants in Precision Cleaning: Removal of Contaminants at the Micro and Nanoscale is a single source of information on surfactants, emulsions, microemulsions and detergents for removal of surface contaminants at the micro and nanoscale. The topics covered include cleaning mechanisms, effect of surfactants, types of stable dispersions (emulsions, microemulsions, surfactants, detergents, etc.), cleaning technology, and cleaning applications. Users will find this volume an excellent resource on the use of stable dispersions in precision cleaning.

Developments in Surface Contamination and Cleaning: Methods for Assessment and Verification of Cleanliness of Surfaces and Characterization of Surface Contaminants, Volume Twelve, the latest release in the Developments in Surface Contamination and Cleaning series, provides best practices on determining surface cleanliness. Chapters include an introduction to the nature and size of particles, a discussion of cleanliness levels, detailed coverage of measurement methods, characterization methods and analytical methods for evaluating surfaces, and an overview of analysis methods for various contaminants. As a whole, the series creates a unique and comprehensive knowledge base for those in research and development in a variety of industries. Manufacturing, quality control and procurement specification professionals in the aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography industries will find this book to be very helpful. In addition, researchers in an academic setting will also find these volumes excellent source books.

The contributions in this volume cover methods for removal of particle contaminants on surfaces. Several of these methods are well established and have been employed in industrial applications for a long time. However, the ever- higher demand for removal of smaller particles on newer substrate materials is driving continuous development of the established cleaning methods and alternative innovative methods for particle removal. This book provides information on the latest developments in this topic area.

Feature: Comprehensive coverage of innovations in surface contamination and cleaning

Benefit: One-stop series where a wide range of readers will be sure to find a solution to their cleaning problem, saving the time involved in consulting a range of disparate sources.

Feature: Written by established experts in the contamination and cleaning field

Benefit: Provides an authoritative resource

Feature: Each chapter is a comprehensive review of the state of the art.

Benefit: Can be relied on to provide insight, clarity and real expertise on up-to-the-minute innovations.

Feature: Case studies included

Benefit: Case studies help the reader see theory applied to the solution of real-world practical cleaning and contamination problems.

Developments in Surface Contamination and Cleaning: Methods for Surface Cleaning, Volume 9, part of the Developments in Surface Contamination and Cleaning series provide a state-of-the-art guide to the current knowledge on the behavior of film-type and particulate surface contaminants and their associated cleaning methods. This newest volume in the series discusses methods of surface cleaning of contaminants and the resources that are needed to deal with them. Taken as a whole, the series forms a unique reference for professionals and academics working in the area of surface contamination and cleaning. A strong theme running through the series is that of surface contamination and cleaning at the micro and nano scales.

Volume 7 & 8
The device sizes in the semiconductor industries are shrinking, devices become more vulnerable to smaller contaminant particles, and most conventional cleaning techniques employed in the industry are not effective at smaller scales. New cleaning techniques will have to be considered and employed for contaminant removal. Similarly, new cleaning techniques for molecular contaminants will also have to be deployed.
The book series Developments in Surface Contamination and Cleaning as a whole will provide an excellent source of information on these alternative cleaning techniques as well as methods for characterization and validation of surface contamination. Each volume has a particular topical focus, covering the key techniques and recent developments in the area.
Volume 8: Wet and Dry Cleaning Methods
Several novel wet and dry surface cleaning methods are addressed in this Volume. Many of these methods have not been reviewed previously, or the previous reviews are dated. These methods are finding increasing commercial application and the information in this book will be of high value to the reader.
Volume 7 & 8
Edited by the leading experts in small-scale particle surface contamination, cleaning and cleaning control this book will be an invaluable reference for researchers and engineers in R&D, manufacturing, quality control and procurement specification situated in a multitude of industries such as: aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography. Researchers in an academic setting will also find these volumes excellent source books.
This Volume complements other volumes in this series and:
provides a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination
addresses the continuing trends of shrinking device size and contamination vulnerability in a range of industries, spearheaded by the semiconductor industry and other
covers novel wet and dry surface cleaning methods of increasing commercial importance"

Volume 7 & 8

The device sizes in the semiconductor industries are shrinking, devices become more vulnerable to smaller contaminant particles, and most conventional cleaning techniques employed in the industry are not effective at smaller scales. New cleaning techniques will have to be considered and employed for contaminant removal. Similarly, new cleaning techniques for molecular contaminants will also have to be deployed.

The book series "Developments in Surface Contamination and Cleaning" as a whole will provide an excellent source of information on these alternative cleaning techniques as well as methods for characterization and validation of surface contamination. Each volume has a particular topical focus, covering the key techniques and recent developments in the area.

Volume 7: Contamination Sources, Measurement, Validation, and Regulatory Aspects

The chapters in this Volume addressthesources of surface contaminants and various methods for theircollection and characterization, as well as methods for cleanliness validation. Regulatory aspects of cleaning are also covered. The collection of topics in this book is unique and complements other volumes in this series.

Volume 7 & 8

Edited by the leading experts in small-scale particle surface contamination, cleaning and cleaning control this book will be an invaluable reference for researchers and engineers in R&D, manufacturing, quality control and procurement specification situated in a multitude of industries such as: aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography. Researchers in an academic setting will also find these volumes excellent source books.
This Volume complements other volumes in this series and:
provides a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination
addresses the continuing trends of shrinking device size and contamination vulnerability in a range of industries, spearheaded by the semiconductor industry and other
Volume 7]
includes new regulatory aspects"

In this series Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination.

The expert contributions in this volume cover important fundamental aspects of surface contamination that are key to understanding the behavior of specific types of contaminants. This understanding is essential to develop preventative and mitigation methods for contamination control. The coverage complements the treatment of surface contamination in vol.1, Fundamental and Applied Aspects. This volume covers: Sources and Generation of Particles; Manipulation Techniques for Particles on Surfaces; Particle Deposition and Rebound; Particle Behavior in Liquid Systems; Biological and Metallic Contamination; and includes a comprehensive list of current standards and resources.

Feature: Comprehensive coverage of innovations in surface contamination and cleaning

Benefit: One-stop series where a wide range of readers will be sure to find a solution to their cleaning

problem, saving the time involved in consulting a range of disparate sources.

Feature: Written by established experts in the contamination and cleaning field

Benefit: Provides an authoritative resource

Feature: Each chapter is a comprehensive review of the state of the art.

Benefit: Can be relied on to provide insight, clarity and real expertise on up-to-the-minute

innovations.

Feature: Case studies included

Benefit: Case studies help the reader see theory applied to the solution of real-world practical cleaning

and contamination problems.

In this series, Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning ordealing withthe consequences of surface contamination.

This volume complements Volumes 3 and 4 of this series, which focused largely on particulate contaminants. The expert contributions in this volume cover methods for removal of non-particulate contaminants, such as metallic and non-metallic thin films, hydrocarbons, toxic and hazardous chemicals, and microbiological substances, as well as contamination monitoring in pharmaceutical manufacturing, and an innovative method for characterization at the nanoscale.

Feature: Comprehensive coverage of innovations in surface contamination and cleaning

Benefit: One-stop series where a wide range of readers will be sure to find a solution to their cleaning

problem, saving the time involved in consulting a range of disparate sources.

Feature: Written by established experts in the contamination and cleaning field

Benefit: Provides an authoritative resource

Feature: Each chapter is a comprehensive review of the state of the art.

Benefit: Can be relied on to provide insight, clarity and real expertise on up-to-the-minute

innovations.

Feature: Case studies included

Benefit: Case studies help the reader see theory applied to the solution of real-world practical cleaning

and contamination problems."

Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination.

Topics covered include: A systems analysis approach to contamination control Physical factors that influence the behavior of particle deposition in enclosures An overview of current yield models and description of advanced modelsTypes of strippable coatings, their properties and applications of these coatings for removal of surface contaminants In-depth coverage of ultrasonic cleaning Contamination and cleaning issues at the nanoscaleExperimental results illustrating the impact of model parameters on the removal of particle contamination

The expert contributions in this book provide a valuable source of information on the current status and recent developments in surface contamination and cleaning. The book will be of value to industry, government and academic personnel involved in research and development, manufacturing, process and quality control, and procurement specifications across sectors including microelectronics, aerospace, optics, xerography and joining (adhesive bonding).

ABOUT THE EDITORS

Rajiv Kohli is a leading expert with The Aerospace Corporation in contaminant particle behavior, surface cleaning, and contamination control. At the NASA Johnson Space Center in Houston, Texas, he provides technical support for contamination control related to ground-based and manned spaceflight hardware for the Space Shuttle, the International Space Station, and the new Constellation Program that is designed to meet the United States Vision for Space Exploration.

Kashmiri Lal "Kash" Mittal was associated with IBM from 1972 to 1994. Currently, he is teaching and consulting in the areas of surface contamination and cleaning, and in adhesion science and technology. He is the Editor-in-Chief of the Journal of Adhesion Science and Technology and is the editor of 98 published books, many of them dealing with surface contamination and cleaning.

"Also available"

Developments in Surface Contamination and Cleaning, Volume 1: Fundamentals and Applied Aspects (edited by Rajiv Kohli & K.L. Mittal). ISBN: 9780815515555.

. Provides guidance on best-practice cleaning techniques and the avoidance of surface contamination

. Covers contamination and cleaning issues at the nanoscale

. Includes an in-depth look at ultrasonic cleaning"

Developments in Surface Contamination and Cleaning, Vol. 1: Fundamentals and Applied Aspects, Second Edition, provides an excellent source of information on alternative cleaning techniques and methods for characterization of surface contamination and validation. Each volume in this series contains a particular topical focus, covering the key techniques and recent developments in the area. This volume forms the heart of the series, covering the fundamentals and application aspects, characterization of surface contaminants, and methods for removal of surface contamination. In addition, new cleaning techniques effective at smaller scales are considered and employed for removal where conventional cleaning techniques fail, along with new cleaning techniques for molecular contaminants. The Volume is edited by the leading experts in small particle surface contamination and cleaning, providing an invaluable reference for researchers and engineers in R&D, manufacturing, quality control, and procurement specification in a multitude of industries such as aerospace, automotive, biomedical, defense, energy, manufacturing, microelectronics, optics and xerography.

Developments in Surface Contamination and Cleaning, Volume Ten, provides a state-of-the-art guide to the current knowledge on the behavior of film-type and particulate surface contaminants and their cleaning methods. This newest volume in the series discusses mechanisms of particle adhesion, particle behavior in liquid systems, and metallic contamination and its impact. In addition, the book includes a discussion of the types of contaminants, with resources to deal with them and information on environmental issues related to surface contamination and cleaning. Taken as a whole, the series forms a unique reference for professionals and academics working in the area of surface contamination and cleaning that also includes information on cleaning at the micro and nano scales.

In this series Rajiv Kohli and Kash Mittal have brought together the work of experts from different industry sectors and backgrounds to provide a state-of-the-art survey and best-practice guidance for scientists and engineers engaged in surface cleaning or handling the consequences of surface contamination. The expert contributions in this volume cover important fundamental aspects of surface contamination that are key to understanding the behavior of specific types of contaminants. This understanding is essential to develop preventative and mitigation methods for contamination control. The coverage complements the treatment of surface contamination in vol.1, Fundamental and Applied Aspects. This volume covers: Sources and Generation of Particles; Manipulation Techniques for Particles on Surfaces; Particle Deposition and Rebound; Particle Behavior in Liquid Systems; Biological and Metallic Contamination; and includes a comprehensive list of current standards and resources.