In fabrication of FeRAMs, various academic and technological
backgrounds are necessary, which include ferroelectric materials,
thin film formation, device physics, circuit design, and so on.
This book covers from fundamentals to applications of ferroelectric
random access memories (FeRAMs). The book consists of 5 parts: (1)
ferroelectric thin films, (2) deposition and characterization
methods, (3) fabrication process and circuit design, (4)
advanced-type memories, and (5) applications and future prospects;
each part is further divided into several chapters. Because of the
wide range of topics discussed, each chapter in this book was
written by one of the best authors knowing the specific topic very
well. Thus, this is a good introductory book on FeRAM for graduate
students and newcomers to this field; it also helps specialists to
understand FeRAMs more deeply.
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