Amorphous and Heterogeneous Silicon Thin Films: Fundamentals to Devices - 1999: Volume 557 (Hardcover)

Applications requiring large-area semiconductor coverage rely increasingly on amorphous and heterogeneous silicon materials because they can be deposited at low cost on a variety of substrates. This volume, first published in 1999, covers the range from fundamental research to the device applications of these materials. A special session on medium-range order is featured, and confirms the belief that ordering correlates with the electronic quality of a-Si: H films. Important experimental observations on metastable effects in a-Si: H are also reported, as are devices and processing strategies. Topics include: growth and properties; high-rate deposition; recrystallization, amorphization and porous silicon; ordering and hydrogen; metastability; defects, band tails and transport; heterogeneous materials and devices; thin-film transistors and displays; solar cells; and detectors, imagers and other device

General

Imprint:	Materials Research Society
Country of origin:	United States
Series:	MRS Proceedings
Release date:	December 1999
First published:	July 2013
Editors:	Howard M. Branz • Robert W Collins • Hiroaki Okamoto • Subhendu Guha • Ruud Schropp
Dimensions:	228 x 152 x 48mm (L x W x T)
Format:	Hardcover - Cloth over boards
Pages:	914
ISBN-13:	978-1-55899-464-5
Categories:	Books > Professional & Technical > Mechanical engineering & materials > Materials science > General Books > Professional & Technical > Electronics & communications engineering > Electronics engineering > Electronic devices & materials > Semi-conductors & super-conductors Promotions
LSN:	1-55899-464-5
Barcode:	9781558994645

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