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Kinetic Studies in GeO2/Ge System - A Retrospective from 2021 (Hardcover)
Loot Price: R3,386
Discovery Miles 33 860
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Kinetic Studies in GeO2/Ge System - A Retrospective from 2021 (Hardcover)
Series: New Wave of Semiconductor Technology
Expected to ship within 12 - 17 working days
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Kinetic Studies in GeO2/Ge System: A Retrospective from 2021
investigates reaction kinetics in GeO2/Ge systems, aiming to
demonstrate the fundamentals of the GeO2/Ge interface and to give
insight into the distinctive features and performance of Ge
(germanium) applied to advanced complementary metal oxide
semiconductor (CMOS) devices. This book first reviews the
development of MOS technology and discusses the potentials of
emerging Ge and the challenges facing it as a contentious channel
material, once promising to replace Si (silicon) for advanced
nodes. The study systematically analyzes the following aspects of
GeO2/Ge stacks that will shed light on the characteristics and
reaction principles of the system: GeO2/Ge degradation, Ge
passivation techniques, desorption kinetics of GeO from GeO2/Ge,
the relationship between GeO2 crystallization and GeO2/Ge interface
reaction, and the oxidation kinetics of Ge. Based on findings from
the intrinsic properties of GeO2/Ge, the author also compares it
with prevalent SiO2/Si systems and demonstrates the essential
differences between the two, contributing to quality control,
process optimization, and technology advancements of GeO2/Ge. The
book will be a useful reference for researchers, professionals, and
students interested in electronic materials, condenser matter
physics, microelectronic engineering, and semiconductors.
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