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Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications (Hardcover, New) Loot Price: R2,224
Discovery Miles 22 240
Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications (Hardcover, New): John E J Schmitz

Chemical Vapor Deposition of Tungsten and Tungsten Silicides for VLSI/ ULSI Applications (Hardcover, New)

John E J Schmitz

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Loot Price R2,224 Discovery Miles 22 240 | Repayment Terms: R208 pm x 12*

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This monograph condenses the relevant and pertinent literature on blanket and selective CVD of tungsten (W) into a single manageable volume. The book supplies the reader with the necessary background to bring up, fine tune, and successfully maintain a CVD-W process in a production set-up. Materials deposition chemistry, equipment, process technology, developments, and applications are described.

General

Imprint: William Andrew Publishing
Country of origin: United States
Release date: December 1992
First published: 1992
Authors: John E J Schmitz
Dimensions: 229 x 152 x 15mm (L x W x T)
Format: Hardcover
Pages: 251
Edition: New
ISBN-13: 978-0-8155-1288-2
Categories: Books > Professional & Technical > Industrial chemistry & manufacturing technologies > Metals technology / metallurgy
Books > Professional & Technical > Electronics & communications engineering > Electronics engineering > Circuits & components
Books > Computing & IT > Computer hardware & operating systems > Computer architecture & logic design > General
Books > Academic & Education > Professional & Technical > Electronics
LSN: 0-8155-1288-0
Barcode: 9780815512882

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