Pulsed laser deposition (PLD) is at present one of the most
interesting technique for thin film deposition. In the PLD process
a film is formed by ablating a solid target with energetic laser
pulses and collecting the material of interest on a substrate
placed a few cm from the target. According to its ability to carry
the stoichiometry from the target to the substrate and to its
relatively high growth rate (~0.1 nm/pulse), PLD is an attractive
technique for compound thin film deposition. This technique offers
the possibility of depositing thin films on room-temperature or
low-temperature substrates, due to the high energy of the species
forming the laser plasma plume expanding from the target to the
substrate. This book reviews research on the depositon of c-BN
films by using PLD, ion-assisted PLD and other laser-assisted
procedures.
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