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In Situ Characterization of Thin Film Growth (Hardcover, New)
Loot Price: R3,987
Discovery Miles 39 870
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In Situ Characterization of Thin Film Growth (Hardcover, New)
Series: Woodhead Publishing Series in Electronic and Optical Materials
Expected to ship within 12 - 17 working days
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Advanced techniques for characterizing thin film growth in situ
help to develop improved understanding and faster diagnosis of
issues with the process. In situ characterization of thin film
growth reviews current and developing techniques for characterizing
the growth of thin films, covering an important gap in research.
Part one covers electron diffraction techniques for in situ study
of thin film growth, including chapters on topics such as
reflection high-energy electron diffraction (RHEED) and inelastic
scattering techniques. Part two focuses on photoemission
techniques, with chapters covering ultraviolet photoemission
spectroscopy (UPS), X-ray photoelectron spectroscopy (XPS) and in
situ spectroscopic ellipsometry for characterization of thin film
growth. Finally, part three discusses alternative in situ
characterization techniques. Chapters focus on topics such as ion
beam surface characterization, real time in situ surface monitoring
of thin film growth, deposition vapour monitoring and the use of
surface x-ray diffraction for studying epitaxial film growth.
With its distinguished editors and international team of
contributors, In situ characterization of thin film growth is a
standard reference for materials scientists and engineers in the
electronics and photonics industries, as well as all those with an
academic research interest in this area.
Chapters review electron diffraction techniques, including the
methodology for observations and measurementsDiscusses the
principles and applications of photoemission techniquesExamines
alternative in situ characterisation techniques
General
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