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Scanning Probe Lithography (Hardcover, 2001 ed.)
Loot Price: R2,915
Discovery Miles 29 150
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Scanning Probe Lithography (Hardcover, 2001 ed.)
Series: Microsystems, 7
Expected to ship within 10 - 15 working days
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Scanning Probe Lithography (SPL) describes recent advances in the
field of scanning probe lithography, a high resolution patterning
technique that uses a sharp tip in close proximity to a sample to
pattern nanometer-scale features on the sample. SPL is capable of
patterning sub-30nm features with nanometer-scale alignment
registration. It is a relatively simple, inexpensive, reliable
method for patterning nanometer-scale features on various
substrates. It has potential applications for nanometer-scale
research, for maskless semiconductor lithography, and for photomask
patterning. The authors of this book have been key players in this
exciting new field. Calvin Quate has been involved since the
beginning in the early 1980s and leads the research time that is
regarded as the foremost group in this field. Hyongsok Tom Soh and
Kathryn Wilder Guarini have been the members of this group who, in
the last few years, have brought about remarkable series of
advances in SPM lithography. Some of these advances have been in
the control of the tip which has allowed the scanning speed to be
increased from mum/second to mm/second. Both non-contact and
in-contact writing have been demonstrated as has controlled writing
of sub-100 nm lines over large steps on the substrate surface. The
engineering of a custom-designed MOSFET built into each
microcantilever for individual current control is another notable
achievement. Micromachined arrays of probes each with individual
control have been demonstrated. One of the most intriguing new
aspects is the use of directly-grown carbon nanotubes as robust,
high-resolution emitters. In this book the authors concisely and
authoritatively describe the historical context, the relevant
inventions, and the prospects for eventual manufacturing use of
this exciting new technology.
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