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Books > Professional & Technical > Electronics & communications engineering > Electronics engineering > Applied optics > Laser technology

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Theory and Application of Laser Chemical Vapor Deposition (Hardcover, 1995 ed.) Loot Price: R4,239
Discovery Miles 42 390
Theory and Application of Laser Chemical Vapor Deposition (Hardcover, 1995 ed.): J. Mazumder, Aravinda Kar

Theory and Application of Laser Chemical Vapor Deposition (Hardcover, 1995 ed.)

J. Mazumder, Aravinda Kar

Series: Lasers, Photonics, and Electro-Optics

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Loot Price R4,239 Discovery Miles 42 390 | Repayment Terms: R397 pm x 12*

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In this monograph, the authors offer a comprehensive examination of the latest research on Laser Chemical Vapor Deposition (LCVD). Chapters explore the physics of LCVD as well as the principles of a wide range of related phenomena-including laser-matter interactions, heat transfer, fluid flow, chemical kinetics, and adsorption. With this reference, researchers will discover how to apply these principles to developing theories about various types of LCVD processes; gain greater insight into the basic mechanisms of LCVD; and obtain the ability to design and control an LCVD system.

General

Imprint: Kluwer Academic / Plenum Publishers
Country of origin: United States
Series: Lasers, Photonics, and Electro-Optics
Release date: 2001
First published: 1995
Authors: J. Mazumder • Aravinda Kar
Dimensions: 229 x 152 x 27mm (L x W x T)
Format: Hardcover
Pages: 396
Edition: 1995 ed.
ISBN-13: 978-0-306-44936-9
Categories: Books > Professional & Technical > Electronics & communications engineering > Electronics engineering > Applied optics > Laser technology
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LSN: 0-306-44936-6
Barcode: 9780306449369

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