In this monograph, the authors offer a comprehensive examination of
the latest research on Laser Chemical Vapor Deposition (LCVD).
Chapters explore the physics of LCVD as well as the principles of a
wide range of related phenomena-including laser-matter
interactions, heat transfer, fluid flow, chemical kinetics, and
adsorption. With this reference, researchers will discover how to
apply these principles to developing theories about various types
of LCVD processes; gain greater insight into the basic mechanisms
of LCVD; and obtain the ability to design and control an LCVD
system.
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