Predictive Simulation of Semiconductor Processing enables
researchers and developers to extend the scaling range of
semiconductor devices beyond the parameter range of empirical
research. It requires a thorough understanding of the basic
mechanisms employed in device fabrication, such as diffusion, ion
implantation, epitaxy, defect formation and annealing, and
contamination. This book presents an in-depth discussion of our
current understanding of key processes and identifies areas that
require further work in order to achieve the goal of a
comprehensive, predictive process simulation tool.
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