According to the Semiconductor Industry Association's 1999
International Technology Roadmap for Semiconductors, by the year
2008 the integration of more than 500 million transistors will be
possible on a single chip. Integrating transistors on silicon will
depend increasingly on design reuse.
Design reuse techniques have become the subject of books,
conferences, and podium discussions over the last few years.
However, most discussions focus on higher-level abstraction like
RTL descriptions, which can be synthesized. Design reuse is often
seen as an add-on to normal design activity, or a special design
task that is not an integrated part of the existing design flow.
This may all be true for the ASIC world, but not for high-speed,
high-performance microprocessors.
In the field of high-speed microprocessors, design reuse is an
integrated part of the design flow. The method of choice in this
demanding field was, and is always, physical design reuse at the
layout level. In the past, the practical implementations of this
method were linear shrinks and the lambda approach. With the
scaling of process technology down to 0.18 micron and below, this
approach lost steam and became inefficient.
The only viable solution is a method, which is now called Automatic
Layout Modification (ALM). It combines compaction, mask
manipulation, and correction with powerful capabilities.
Automatic Layout Modification, Including design reuse of the
Alpha CPU in 0.13 micron SOI technology is a welcome effort to
improving some of the practices in chip design today. It is a
comprehensive reference work on Automatic Layout Modification which
will be valuable to VLSI courses at universities, and to CAD and
circuit engineers and engineering managers.
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