Books > Science & Mathematics > Physics > States of matter > Plasma physics
|
Buy Now
High Density Plasma Sources - Design, Physics and Performance (Hardcover)
Loot Price: R5,374
Discovery Miles 53 740
|
|
High Density Plasma Sources - Design, Physics and Performance (Hardcover)
Expected to ship within 12 - 17 working days
|
This book describes the design, physics, and performance of high
density plasma sources which have been extensively explored in low
pressure plasma processing, such as plasma etching and
planarization, plasma enhanced chemical vapor deposition of thin
films, sputtered deposition of metals and dielectrics, epitaxial
growth of silicon and GaAs, and many other applications. This is a
comprehensive survey and a detailed description of most advanced
high density plasma sources used in plasma processing. The book is
a balanced presentation in that it gives both a theoretical
treatment and practical applications. It should be of considerable
interest to scientists and engineers working on plasma source
design, and process development.
General
Is the information for this product incomplete, wrong or inappropriate?
Let us know about it.
Does this product have an incorrect or missing image?
Send us a new image.
Is this product missing categories?
Add more categories.
Review This Product
No reviews yet - be the first to create one!
|
You might also like..
|
Email address subscribed successfully.
A activation email has been sent to you.
Please click the link in that email to activate your subscription.