High Density Plasma Sources - Design, Physics and Performance (Hardcover)

This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. The book is a balanced presentation in that it gives both a theoretical treatment and practical applications. It should be of considerable interest to scientists and engineers working on plasma source design, and process development.

General

Imprint:	William Andrew Publishing
Country of origin:	United States
Release date:	December 1996
First published:	1997
Authors:	Oleg A. Popov
Dimensions:	229 x 152 x 34mm (L x W x T)
Format:	Hardcover
Pages:	465
ISBN-13:	978-0-8155-1377-3
Categories:	Books > Professional & Technical > Technology: general issues > General Books > Science & Mathematics > Physics > States of matter > Plasma physics Promotions
LSN:	0-8155-1377-1
Barcode:	9780815513773

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