WelcometotheproceedingsofPATMOS2004, thefourteenthinaseriesofint- national workshops. PATMOS 2004 was organized by the University of Patras with technical co-sponsorship from the IEEE Circuits and Systems Society. Over the years, the PATMOS meeting has evolved into an important - ropean event, where industry and academia meet to discuss power and timing aspects in modern integrated circuit and system design. PATMOS provides a forum for researchers to discuss and investigate the emerging challenges in - sign methodologies and tools required to develop the upcoming generations of integrated circuits and systems. We realized this vision this year by providing a technical program that contained state-of-the-art technical contributions, a keynote speech, three invited talks and two embedded tutorials. The technical program focused on timing, performance and power consumption, as well as architectural aspects, with particular emphasis on modelling, design, charac- rization, analysis and optimization in the nanometer era. This year a record 152 contributions were received to be considered for p- sible presentation at PATMOS. Despite the choice for an intense three-day m- ting, only 51 lecture papers and 34 poster papers could be accommodated in the single-track technical program. The Technical Program Committee, with the - sistance of additional expert reviewers, selected the 85 papers to be presented at PATMOS and organized them into 13 technical sessions. As was the case with the PATMOS workshops, the review process was anonymous, full papers were required, and several reviews were received per manuscript

Welcome to the proceedings of PATMOS 2003. This was the 13th in a series of international workshops held in several locations in Europe. Over the years, PATMOS has gained recognition as one of the major European events devoted to power and timing aspects of integrated circuit and system design. Despite its signi?cant growth and development, PATMOS can still be considered as a very informal forum, featuring high-level scienti?c presentations together with open discussions and panel sessions in a free and relaxed environment. This year, PATMOS took place in Turin, Italy, organized by the Politecnico di Torino, with technical co-sponsorship from the IEEE Circuits and Systems Society and the generous support of the European Commission, as well as that of several industrial sponsors, including BullDAST, Cadence, Mentor Graphics, STMicroelectronics, and Synopsys. The objective of the PATMOS workshop is to provide a forum to discuss and investigate the emerging problems in methodologies and tools for the design of new generations of integrated circuits and systems. A major emphasis of the technical program is on speed and low-power aspects, with particular regard to modeling, characterization, design, and architectures.

This book presents the outcome of the European project "SERENA", involving fourteen partners as international academics, technological companies, and industrial factories, addressing the design and development of a plug-n-play end-to-end cloud architecture, and enabling predictive maintenance of industrial equipment to be easily exploitable by small and medium manufacturing companies with a very limited data analytics experience. Perspectives and new opportunities to address open issues on predictive maintenance conclude the book with some interesting suggestions of future research directions to continue the growth of the manufacturing intelligence.

This book presents the outcome of the European project "SERENA", involving fourteen partners as international academics, technological companies, and industrial factories, addressing the design and development of a plug-n-play end-to-end cloud architecture, and enabling predictive maintenance of industrial equipment to be easily exploitable by small and medium manufacturing companies with a very limited data analytics experience. Perspectives and new opportunities to address open issues on predictive maintenance conclude the book with some interesting suggestions of future research directions to continue the growth of the manufacturing intelligence.