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Ion Implantation in Semiconductors - Proceedings of the II. International Conference on Ion Implantation in Semiconductors,... Ion Implantation in Semiconductors - Proceedings of the II. International Conference on Ion Implantation in Semiconductors, Physics and Technology, Fundamental and Applied Aspects May 24-28, 1971, Garmisch-Partenkirchen, Bavaria, Germany (Paperback, Softcover reprint of the original 1st ed. 1971)
Ingolf Ruge, J. Graul
R3,053 Discovery Miles 30 530 Ships in 10 - 15 working days

In recent years great progress has been made in the field of ion implantation, particularly with respect to applications in semiconductors. It would be impos sible not to note the growing interest in this field, both by research groups and those directly concerned with production of devices. Furthermore, as several papers have pointed out, ion implantation and its associated technologies promise exciting advances in the development of new kinds of devices and provide power ful new tools for materials investigations. It was, therefore, appropriate to arrange the II. International Conference on Ion Implantation in Semiconductors within the rather short time of one year since the first conference was held in 1970 in Thousand Oaks, California. Although ori ginally planned on a small scale with a very limited number of participants, more than two hundred scientists from 15 countries participated in the Conference which was held May 24 - 28, 1971 at the Congress Center in Garmisch-Partenkirchen. This volume contains the papers that were presented at the Conference. Due to the tremendous volume of research presented, publication here of all the works in full detail was not possible. Many authors therefore graciously agreed to submit abbreviated versions of their papers."

Halbleiter-Technologie (German, Hardcover, 3rd 3., Vollig Neubearb. Und Erw. Aufl. 1991 ed.): Ingolf Ruge, Hermann Mader Halbleiter-Technologie (German, Hardcover, 3rd 3., Vollig Neubearb. Und Erw. Aufl. 1991 ed.)
Ingolf Ruge, Hermann Mader
R2,452 Discovery Miles 24 520 Ships in 10 - 15 working days

Aus den Besprechungen: "Der Autor wendet sich mit diesem Buch an Leser, die Halbleiterkomponenten herstellen wollen. Er versucht einen Mittelweg zu nehmen, indem er sich auf grundlegende Theorien abstutzt, aber auch technologische Prozesse beschreibt. Auch Schwierigkeiten, die entstehen, wenn neu entwickelte Technologien in die Produktion ubergefuhrt werden mussen, verschweigt er nicht. ..." #"PTT " "Bulletin technique/Technische Mitteilungen"# ..". Dem Autor dieses Buches ist es gelungen, sowohl die grundlegenden Theorien als auch die technologischen Prozesse und Verfahren in einer lebendigen und eindrucksvollen Art zu behandeln. Das Buch wird viele Freunde finden." #"Elin-Zeitschrift"# "Das Buch schliesst eine Lucke in der deutschsprachigen Literatur, die von Lehrenden und Lernenden und sicher auch von Praktikern stark empfunden wurde. Der Versuch des Verfassers, sich bei der Beschreibung der technologischen Prozesse nicht in Einzelheiten zu verlieren, vielmehr das Grundsatzliche herauszustellen und auch theoretisch abzustutzen, darf als gegluckt bezeichnet werden..." #"AEU " "Archiv fur Elektronik und Ubertragungstechnik"#"

Ionenimplantation (German, Paperback, Softcover Reprint of the Original 1st 1978 ed.): Heiner Ryssel, Ingolf Ruge Ionenimplantation (German, Paperback, Softcover Reprint of the Original 1st 1978 ed.)
Heiner Ryssel, Ingolf Ruge
R1,967 Discovery Miles 19 670 Ships in 10 - 15 working days
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