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This book covers many advances in the subjects of nano-optics and
nano photonics. The author describes the principle and technical
schematics of common methods for breaking through the optical
diffraction limit and focuses on realizing optical super-resolution
with nonlinear effects of thin film materials. The applications of
nonlinear optical super-resolution effects in nano-data storage,
nanolithography, and nano-imaging are also presented. This book is
useful to graduate students majoring in optics and nano science and
also serves as a reference book for academic researchers,
engineers, technical professionals in the fields of
super-resolution optics and laser techniques, nano-optics and nano
photonics, nano-data storage, nano imaging, micro/nanofabrication
and nanolithography and nonlinear optics.
This book provides a systematic description and analysis of laser
heat-mode lithography, addressing the basic principles, lithography
system, manipulation of feature size, grayscale lithography, resist
thin films, and pattern transfer, while also presenting typical
experimental results and applications. It introduces laser
heat-mode lithography, where the resist thin films are essentially
an opto-thermal response to the laser beam with changeable
wavelength and are not sensitive to laser wavelength. Laser
heat-mode lithography techniques greatly simplify production
procedures because they require neither a particular light source
nor a particular environment; further, there are no pre-baking and
post-baking steps required for organic photoresists. The pattern
feature size can be either larger or smaller than the laser spot by
adjusting the writing strategy. The lithographic feature size can
also be arbitrarily tuned from nanoscale to micrometer without
changing the laser spot size. Lastly, the line edge roughness can
be controlled at a very low value because the etching process is a
process of breaking bonds among atoms. The book offers an
invaluable reference guide for all advanced undergraduates,
graduate students, researchers and engineers working in the fields
of nanofabrication, lithography techniques and systems, phase
change materials, etc.
This book covers many advances in the subjects of nano-optics and
nano photonics. The author describes the principle and technical
schematics of common methods for breaking through the optical
diffraction limit and focuses on realizing optical super-resolution
with nonlinear effects of thin film materials. The applications of
nonlinear optical super-resolution effects in nano-data storage,
nanolithography, and nano-imaging are also presented. This book is
useful to graduate students majoring in optics and nano science and
also serves as a reference book for academic researchers,
engineers, technical professionals in the fields of
super-resolution optics and laser techniques, nano-optics and nano
photonics, nano-data storage, nano imaging, micro/nanofabrication
and nanolithography and nonlinear optics.
This book provides a systematic description and analysis of laser
heat-mode lithography, addressing the basic principles, lithography
system, manipulation of feature size, grayscale lithography, resist
thin films, and pattern transfer, while also presenting typical
experimental results and applications. It introduces laser
heat-mode lithography, where the resist thin films are essentially
an opto-thermal response to the laser beam with changeable
wavelength and are not sensitive to laser wavelength. Laser
heat-mode lithography techniques greatly simplify production
procedures because they require neither a particular light source
nor a particular environment; further, there are no pre-baking and
post-baking steps required for organic photoresists. The pattern
feature size can be either larger or smaller than the laser spot by
adjusting the writing strategy. The lithographic feature size can
also be arbitrarily tuned from nanoscale to micrometer without
changing the laser spot size. Lastly, the line edge roughness can
be controlled at a very low value because the etching process is a
process of breaking bonds among atoms. The book offers an
invaluable reference guide for all advanced undergraduates,
graduate students, researchers and engineers working in the fields
of nanofabrication, lithography techniques and systems, phase
change materials, etc.
Non-linear optical phenomena have been widely investigated and well
understood since the invention of the Laser. Lots of applications
of the non-linear optical phenomena have always been advanced in
various fields, such as, optical information storage, all-light
computing, optical switch, optical limiters,
micro-nano-fabrication, etc., Non-linear optics has been developed
into a subfield of optics, and there is no indication that either
the developments of non-linear optics or its applications are
slowing down. In non-linear optics, the characterisation and
measurement techniques of the non-linear index are critical for
understanding the non-linear physical process and developing new
applications. In this book, different optical non-linearity
characterisation and measurement methods are introduced and
non-linear problems are discussed theoretically. This book is
invaluable to advanced undergraduates, graduate students and
researchers working in the fields of physics, materials, and
chemistry.
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