The Conference on the Science and Technology of Thin Film Superconductors was conceived in the early part of 1988 as a forum for the specialist in thin film superconductivity. The conference was held on November 14-18, 1988, in Co lorado Springs, Co lorado. Al though many excellent superconductivity conferences had been convened in the wake of the 1986-1987 discoveries in high temperature superconductivity, thin film topics were often dispersed among the sessions of a more general conference agenda. The response to the Conference on the Science and Technology of Thin Film Superconductors confirmed the need for an extended conference devoted to thin film superconductors. These proceedings are a major contribution to the technnology of thin film superconductivity because of the breadth and quality of the articles provided by leaders in the field. The proceedings are divided into articles on laser deposition, sputtering, evaporation, metal organic chemical vapor deposition, thick film, substrate studies, characterization, patterning and applications, and general properties. Most of the articles discuss scientific issues for high temperature thin film superconductors, although the conference was to be a forum for technology and scientific questions for both low and high temperature superconductivity. For the first day of the 5 day conference, Lawrence Berkeley Laboratory had organized an excellent set of short courses in superconduc t ing thin film devices.

This conference is the second on the Science and Technology of Thin Film Superconductors. It proved to be an excellent forum for these specialists in thin film superconductivity. The conference, held April 30-May 4, 1990, in Denver, Colorado, hosted 170 researchers from 17 countries. The response to the conference again emphasized the need for a meeting devoted to the science and technology of thin film superconductors. The breadth of artic1es and advances made in this technology since the first conference in November 1988, reflect on the maturity of the topic. These proceedings contain artic1es on deposition methods by sputtering, e1ectron beam evaporation, resistive evaporation, laser ablation, chemical vapor deposition and electrodeposition, and on other studies related to substrates, thermodynamics of formation, grain boundaries and weak links, characterization, and some practical applications. The program committee was pleased with the quality of the publications and contributed articles. This conference was highlighted by a fuU day dedicated to presentations from the federallaboratories, discussing a wide range of topics on the fabrication, characterization, and theory of high-temperature superconductor thin films. Other highlights at the conference dealt with (1) critical parameters or problems in measuring critical current density and other important parameters, and (2) problems of scale-up, reproducibility, and amenability to device fabrication. It became evident from the presentations that three issues were developing into critical issues for the ultimate practical application of high temperature superconductor thin films."