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Carbon has always been a unique and intriguing material from a
funda mental standpoint and, at the same time, a material with many
technological uses. Carbon-based materials, diamond, graphite and
their many deriva tives, have attracted much attention in recent
years for many reasons. Ion implantation, which has proven to be
most useful in modifying the near surface properties of many kinds
of materials, in particular semiconductors, has also been applied
to carbon-based materials. This has yielded, mainly in the last
decade, many scientifically interesting and technologically impor
tant results. Reports on these studies have been published in a
wide variety of journals and topical conferences, which often have
little disciplinary overlap, and which often address very different
audiences. The need for a review to cover in an integrated way the
various diverse aspects of the field has become increasingly
obvious. Such a review should allow the reader to get an overview
of the research that has been done thus far, to gain an ap
preciation of the common features in the response of the various
carbon to ion impact, and to become aware of current research oppor
allotropes tunities and unresolved questions waiting to be
addressed. Realizing this, and having ourselves both contributed to
the field, we decided to write a review paper summarizing the
experimental and theoretical status of ion implantation into
diamond, graphite and related materials."
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