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Macromolecular self-assembly - driven by weak, non-covalent,
intermolecular forces - is a common principle of structure
formation in natural and synthetic organic materials. The
variability in material arrangement on the nanometre length scale
makes this an ideal way of matching the structure-function demands
of photonic and optoelectronic devices. However, suitable soft
matter systems typically lack the appropriate photoactivity,
conductivity or chemically stability. This thesis explores the
implementation of soft matter design principles for inorganic thin
film nanoarchitectures. Sacrificial block copolymers and colloids
are employed as structure-directing agents for the co-assembly of
solution-based inorganic materials, such as TiO_2 and SiO_2. Novel
fabrication and characterization methods allow unprecedented
control of material formation on the 10 - 500 nm length scale,
allowing the design of material architectures with interesting
photonic and optoelectronic properties.
Macromolecular self-assembly - driven by weak, non-covalent,
intermolecular forces - is a common principle of structure
formation in natural and synthetic organic materials. The
variability in material arrangement on the nanometre length scale
makes this an ideal way of matching the structure-function demands
of photonic and optoelectronic devices. However, suitable soft
matter systems typically lack the appropriate photoactivity,
conductivity or chemically stability. This thesis explores the
implementation of soft matter design principles for inorganic thin
film nanoarchitectures. Sacrificial block copolymers and colloids
are employed as structure-directing agents for the co-assembly of
solution-based inorganic materials, such as TiO_2 and SiO_2. Novel
fabrication and characterization methods allow unprecedented
control of material formation on the 10 - 500 nm length scale,
allowing the design of material architectures with interesting
photonic and optoelectronic properties.
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