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Process Technology for Semiconductor Lasers - Crystal Growth and Microprocesses (Paperback, Softcover reprint of the original... Process Technology for Semiconductor Lasers - Crystal Growth and Microprocesses (Paperback, Softcover reprint of the original 1st ed. 1996)
Ken'ichi Iga, Susumu Kinoshita
R1,474 Discovery Miles 14 740 Ships in 10 - 15 working days

Process Technology for Semiconductor Lasers describes the design principles of semiconductor lasers, mainly from the fabrication point of view. A review is given of the history of semiconductor-laser development and applications and of the materials used in lasing at short to long wavelengths. The basic design principles for semiconductor-laser devices and the epitaxy for laser production are discussed. An entire chapter is devoted to the technology of liquid-phase epitaxy, and another one to vapor-phase and beam epitaxies. The characterizations of laser materials and the fabrication and characteristics of semiconductor lasers are treated. Mode-control techniques are presented, and surface-emitting lasers are introduced in the final chapter.

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