This book provides an in-depth, self-contained introduction of
partially coherent imaging theory for researchers and engineers
working on optical lithography for semiconductor manufacturing,
including those in the EDA industry. It is mathematically complete:
the opening chapters discuss the essential principles, and all
derivations are presented with their intermediate steps. For
increased accessibility, simplified and consistent notations are
used throughout the text. Full-color pages illustrate the
connections between figures and equations.
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