Silicon Devices and Process Integration covers state-of-the-art
silicon devices, their characteristics, and their interactions with
process parameters. It serves as a comprehensive guide which
addresses both the theoretical and practical aspects of modern
silicon devices and the relationship between their electrical
properties and processing conditions. The book is compiled from the
author's industrial and academic lecture notes and reflects years
of experience in the development of silicon devices. Features
include: A review of silicon properties which provides a foundation
for understanding the device properties discussion, including
mobility-enhancement by straining silicon; State-of-the-art
technologies on high-K gate dielectrics, low-K dielectrics, Cu
interconnects, and SiGe BiCMOS; CMOS-only applications, such as
subthreshold current and parasitic latch-up; Advanced Enabling
processes and process integration. This book is written for
engineers and scientists in semiconductor research, development and
manufacturing. The problems at the end of each chapter and the
numerous charts, figures and tables also make it appropriate for
use as a text in graduate and advanced undergraduate courses in
electrical engineering and materials science.
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