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Books > Professional & Technical > Electronics & communications engineering > Electronics engineering > Electronic devices & materials > Semi-conductors & super-conductors
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Introducing Technology Computer-Aided Design (TCAD) - Fundamentals, Simulations, and Applications (Hardcover)
Loot Price: R3,734
Discovery Miles 37 340
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Introducing Technology Computer-Aided Design (TCAD) - Fundamentals, Simulations, and Applications (Hardcover)
Expected to ship within 10 - 15 working days
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This might be the first book that deals mostly with the 3D
technology computer-aided design (TCAD) simulations of major
state-of-the-art stress- and strain-engineered advanced
semiconductor devices: MOSFETs, BJTs, HBTs, nonclassical MOS
devices, finFETs, silicon-germanium hetero-FETs, solar cells, power
devices, and memory devices. The book focuses on how to set up 3D
TCAD simulation tools, from mask layout to process and device
simulation, including design for manufacturing (DFM), and from
device modeling to SPICE parameter extraction. The book also offers
an innovative and new approach to teaching the fundamentals of
semiconductor process and device design using advanced TCAD
simulations of various semiconductor structures. The simulation
examples chosen are from the most popular devices in use today and
provide useful technology and device physics insights. To extend
the role of TCAD in today's advanced technology era, process
compact modeling and DFM issues have been included for
design-technology interface generation. Unique in approach, this
book provides an integrated view of silicon technology and
beyond-with emphasis on TCAD simulations. It is the first book to
provide a web-based online laboratory for semiconductor device
characterization and SPICE parameter extraction. It describes not
only the manufacturing practice associated with the technologies
used but also the underlying scientific basis for those
technologies. Written from an engineering standpoint, this book
provides the process design and simulation background needed to
understand new and future technology development, process modeling,
and design of nanoscale transistors. The book also advances the
understanding and knowledge of modern IC design via TCAD, improves
the quality in micro- and nanoelectronics R&D, and supports the
training of semiconductor specialists. It is intended as a textbook
or reference for graduate students in the field of semiconductor
fabrication and as a reference for engineers involved in VLSI
technology development who have to solve device and process
problems. CAD specialists will also find this book useful since it
discusses the organization of the simulation system, in addition to
presenting many case studies where the user applies TCAD tools in
different situations.
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