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Books > Professional & Technical > Industrial chemistry & manufacturing technologies > Metals technology / metallurgy

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Silver Metallization - Stability and Reliability (Hardcover, 2008 ed.) Loot Price: R2,927
Discovery Miles 29 270
Silver Metallization - Stability and Reliability (Hardcover, 2008 ed.): Daniel Adams, Terry L. Alford, James W. Mayer

Silver Metallization - Stability and Reliability (Hardcover, 2008 ed.)

Daniel Adams, Terry L. Alford, James W. Mayer

Series: Engineering Materials and Processes

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Loot Price R2,927 Discovery Miles 29 270 | Repayment Terms: R274 pm x 12*

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Here is the first book to discuss the current understanding of silver metallization and its potential as a future interconnect material for integrated circuit technology. With the lowest resistivity of all metals, silver is an attractive interconnect material for higher current densities and faster switching speeds in integrated circuits. Over the past ten years, extensive research has been conducted to address the issues that have prevented silver from being used as an interconnect metal. The authors provide details on a wide range of experimental, characterization, and analysis techniques. The book is written for students, scientists, engineers, and technologists in the fields of integrated circuits and microelectronics research and development.

General

Imprint: Springer London
Country of origin: United Kingdom
Series: Engineering Materials and Processes
Release date: October 2007
First published: 2008
Authors: Daniel Adams • Terry L. Alford • James W. Mayer
Dimensions: 235 x 155 x 9mm (L x W x T)
Format: Hardcover
Pages: 123
Edition: 2008 ed.
ISBN-13: 978-1-84800-026-1
Categories: Books > Professional & Technical > Industrial chemistry & manufacturing technologies > Metals technology / metallurgy
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LSN: 1-84800-026-X
Barcode: 9781848000261

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