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Plasma Etching - An Introduction (Hardcover) Loot Price: R1,964
Discovery Miles 19 640
Repayment Terms: R184 pm x 12*
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Plasma Etching - An Introduction (Hardcover): Dennis M. Manos, Daniel L. Flamm

Plasma Etching - An Introduction (Hardcover)

Dennis M. Manos, Daniel L. Flamm

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Loot Price R1,964 Discovery Miles 19 640 | Repayment Terms: R184 pm x 12*

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Plasma etching plays an essential role in microelectronic circuit manufacturing. Suitable for researchers, process engineers, and graduate students, this book introduces the basic physics and chemistry of electrical discharges and relates them to plasma etching mechanisms. Throughout the volume the authors offer practical examples of process chemistry, equipment design, and production methods.

General

Imprint: Academic Press Inc
Country of origin: United States
Release date: September 1989
First published: 1989
Editors: Dennis M. Manos • Daniel L. Flamm
Dimensions: 229 x 152 x 31mm (L x W x T)
Format: Hardcover
Pages: 476
ISBN-13: 978-0-12-469370-8
Categories: Books > Professional & Technical > Technology: general issues > General
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LSN: 0-12-469370-9
Barcode: 9780124693708

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