Ferroelectric Dielectrics Integrated on Silicon (Hardcover)

This book describes up-to-date technology applied to high-K materials for More Than Moore applications, i.e. microsystems applied to microelectronics core technologies.
After detailing the basic thermodynamic theory applied to high-K dielectrics thin films including extrinsic effects, this book emphasizes the specificity of thin films. Deposition and patterning technologies are then presented. A whole chapter is dedicated to the major role played in the field by X-Ray Diffraction characterization, and other characterization techniques are also described such as Radio frequency characterization. An in-depth study of the influence of leakage currents is performed together with reliability discussion. Three applicative chapters cover integrated capacitors, variables capacitors and ferroelectric memories. The final chapter deals with a reasonably new research field, multiferroic thin films.

General

Imprint:	Iste Ltd And John Wiley & Sons Inc
Country of origin:	United Kingdom
Release date:	October 2011
First published:	2011
Authors:	E Defay
Dimensions:	239 x 160 x 30mm (L x W x T)
Format:	Hardcover
Pages:	462
ISBN-13:	978-1-84821-313-5
Categories:	Books > Professional & Technical > Electronics & communications engineering > Electronics engineering > Electronic devices & materials > Semi-conductors & super-conductors
LSN:	1-84821-313-1
Barcode:	9781848213135

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