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Ion Implantation: Basics to Device Fabrication (Paperback, Softcover reprint of the original 1st ed. 1995) Loot Price: R6,348
Discovery Miles 63 480
Ion Implantation: Basics to Device Fabrication (Paperback, Softcover reprint of the original 1st ed. 1995): Emanuele Rimini

Ion Implantation: Basics to Device Fabrication (Paperback, Softcover reprint of the original 1st ed. 1995)

Emanuele Rimini

Series: The Springer International Series in Engineering and Computer Science, 293

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Loot Price R6,348 Discovery Miles 63 480 | Repayment Terms: R595 pm x 12*

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Ion implantation offers one of the best examples of a topic that starting from the basic research level has reached the high technology level within the framework of microelectronics. As the major or the unique procedure to selectively dope semiconductor materials for device fabrication, ion implantation takes advantage of the tremendous development of microelectronics and it evolves in a multidisciplinary frame. Physicists, chemists, materials sci entists, processing, device production, device design and ion beam engineers are all involved in this subject. The present monography deals with several aspects of ion implantation. The first chapter covers basic information on the physics of devices together with a brief description of the main trends in the field. The second chapter is devoted to ion im planters, including also high energy apparatus and a description of wafer charging and contaminants. Yield is a quite relevant is sue in the industrial surrounding and must be also discussed in the academic ambient. The slowing down of ions is treated in the third chapter both analytically and by numerical simulation meth ods. Channeling implants are described in some details in view of their relevance at the zero degree implants and of the available industrial parallel beam systems. Damage and its annealing are the key processes in ion implantation. Chapter four and five are dedicated to this extremely important subject.

General

Imprint: Springer-Verlag New York
Country of origin: United States
Series: The Springer International Series in Engineering and Computer Science, 293
Release date: August 2014
First published: 1995
Authors: Emanuele Rimini
Dimensions: 235 x 155 x 21mm (L x W x T)
Format: Paperback
Pages: 393
Edition: Softcover reprint of the original 1st ed. 1995
ISBN-13: 978-1-4613-5952-4
Categories: Books > Science & Mathematics > Physics > Atomic & molecular physics
Books > Science & Mathematics > Chemistry > Inorganic chemistry > General
Books > Professional & Technical > Mechanical engineering & materials > Materials science > Testing of materials > General
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LSN: 1-4613-5952-X
Barcode: 9781461359524

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