Turn to this new second edition for an understanding of the latest
advances in the chemical vapor deposition (CVD) process. CVD
technology has recently grown at a rapid rate, and the number and
scope of its applications and their impact on the market have
increased considerably. The market is now estimated to be at least
double that of a mere seven years ago when the first edition of
this book was published. This second edition is an update with a
considerably expanded and revised scope.
Plasma CVD and metallic-organic CVD (MOCVD) are two major
factors in this rapid growth. Readers will find the latest data on
both processes in this volume. Likewise, the book explains the
growing importance of CVD in production of semiconductor and
related applications.
The new edition also chronicles the recent expansion of a number
of materials produced by CVD, including copper, tungsten, diamond,
silicon carbide and silicon nitride, titanium nitride, and
others.
Key Features:
- Practical approach in the handbook stresses CVD use in
industry, such as semiconductors, optoelectronics, optics, cutting
tools, refractory fibers, filters, and man others
- Coverage of the chemistry and deposition techniques of new
materials produced by CVD as been greatly expanded in the book
- Special focus on the rapid growth of two major CVD processes:
plasma CVD and metallo-organic CVD
- Emphasizes the broad expansion of the use of CVD processes in
today's industry, showing the reasons for the growth and the
different appli-cations that have developed in the last few
years
General
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