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Handbook of Silicon Wafer Cleaning Technology (Paperback, 3rd edition)
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Handbook of Silicon Wafer Cleaning Technology (Paperback, 3rd edition)
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Handbook of Silicon Wafer Cleaning Technology, Third Edition,
provides an in-depth discussion of cleaning, etching and surface
conditioning for semiconductor applications. The fundamental
physics and chemistry associated with wet and plasma processing are
reviewed, including surface and colloidal aspects. This revised
edition includes the developments of the last ten years to
accommodate a continually involving industry, addressing new
technologies and materials, such as germanium and III-V compound
semiconductors, and reviewing the various techniques and methods
for cleaning and surface conditioning. Chapters include numerous
examples of cleaning technique and their results. The book helps
the reader understand the process they are using for their cleaning
application and why the selected process works. For example,
discussion of the mechanism and physics of contamination, metal,
particle and organic includes information on particle removal,
metal passivation, hydrogen-terminated silicon and other processes
that engineers experience in their working environment. In
addition, the handbook assists the reader in understanding
analytical methods for evaluating contamination. The book is
arranged in an order that segments the various cleaning techniques,
aqueous and dry processing. Sections include theory, chemistry and
physics first, then go into detail for the various methods of
cleaning, specifically particle removal and metal removal, amongst
others.
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