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Sub-Half-Micron Lithography for ULSIs (Paperback, Revised)
Loot Price: R1,125
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Sub-Half-Micron Lithography for ULSIs (Paperback, Revised)
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In semiconductor-device fabrication processes, lithography
technology is used to print circuit patterns on semiconductor
wafers. The remarkable miniaturization of semiconductor devices has
been made possible only because of the continuous progress in
lithography technology. However, for the trend of ever-increasing
miniaturization to continue a breakthrough in lithography
technology is now needed. This book describes advanced techniques
under development in Japan and elsewhere that represent the key to
future semiconductor-device fabrication. The background to
developments in lithography technology, trends in ULSI technology
and future prospects are reviewed, and the requirements that future
lithography technology must meet are described. Several important
lithography methods, such as deep UV lithography, X-ray
lithography, electron-beam lithography, and focused ion-beam
lithography are described in detail by experts in each area. The
principles underlying each of these methods are illustrated at the
beginning of each chapter to help the reader understand the basis
of the different approaches.
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