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Books > Science & Mathematics > Physics > States of matter > Condensed matter physics (liquids & solids)

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Advances in Research and Development, Volume 23 - Modeling of Film Deposition for Microelectronic Applications (Hardcover) Loot Price: R6,486

Discovery Miles 64 860

Repayment Terms: R608 pm x 12*

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Advances in Research and Development, Volume 23 - Modeling of Film Deposition for Microelectronic Applications (Hardcover):...

Advances in Research and Development, Volume 23 - Modeling of Film Deposition for Microelectronic Applications (Hardcover)

Maurice H. Francombe, John L. Vossen

Series: Thin Films

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Loot Price R6,486 Discovery Miles 64 860 | Repayment Terms: R608 pm x 12*

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Significant progress has occurred during the last few years in device technologies and these are surveyed in this new volume. Included are Si/(Si-Ge) heterojunctions for high-speed integrated circuits, Schottky-barrier arrays in Si and Si-Ge alloys for infrared imaging, III-V quantum-well detector structures operated in the heterodyne mode for high-data-rate communications, and III-V heterostructures and quantum-wells for infrared emissions.

General

Imprint:	Academic Press Inc
Country of origin:	United States
Series:	Thin Films
Release date:	November 1997
First published:	October 1997
Series editors:	Maurice H. Francombe • John L. Vossen
Dimensions:	229 x 152 x 22mm (L x W x T)
Format:	Hardcover
Pages:	311
ISBN-13:	978-0-12-533023-7
Categories:	Books > Science & Mathematics > Physics > States of matter > Condensed matter physics (liquids & solids) Books > Professional & Technical > Mechanical engineering & materials > Materials science > General Promotions
LSN:	0-12-533023-5
Barcode:	9780125330237