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Books > Science & Mathematics > Physics > States of matter > Condensed matter physics (liquids & solids)

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Advances in Research and Development, Volume 23 - Modeling of Film Deposition for Microelectronic Applications (Hardcover) Loot Price: R3,448
Discovery Miles 34 480
Repayment Terms: R323 pm x 12*
You Save: R1,617 (32%)
Advances in Research and Development, Volume 23 - Modeling of Film Deposition for Microelectronic Applications (Hardcover):...

Advances in Research and Development, Volume 23 - Modeling of Film Deposition for Microelectronic Applications (Hardcover)

Maurice H. Francombe, John L. Vossen

Series: Thin Films

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List price R5,065 Loot Price R3,448 Discovery Miles 34 480 | Repayment Terms: R323 pm x 12* You Save R1,617 (32%)

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Significant progress has occurred during the last few years in device technologies and these are surveyed in this new volume. Included are Si/(Si-Ge) heterojunctions for high-speed integrated circuits, Schottky-barrier arrays in Si and Si-Ge alloys for infrared imaging, III-V quantum-well detector structures operated in the heterodyne mode for high-data-rate communications, and III-V heterostructures and quantum-wells for infrared emissions.

General

Imprint: Academic Press Inc
Country of origin: United States
Series: Thin Films
Release date: November 1997
First published: October 1997
Series editors: Maurice H. Francombe • John L. Vossen
Dimensions: 229 x 152 x 22mm (L x W x T)
Format: Hardcover
Pages: 311
ISBN-13: 978-0-12-533023-7
Categories: Books > Science & Mathematics > Physics > States of matter > Condensed matter physics (liquids & solids)
Books > Professional & Technical > Mechanical engineering & materials > Materials science > General
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LSN: 0-12-533023-5
Barcode: 9780125330237

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