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PVD for Microelectronics: Sputter Desposition to Semiconductor Manufacturing, Volume 26 (Hardcover) Loot Price: R3,338
Discovery Miles 33 380
Repayment Terms: R313 pm x 12*
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PVD for Microelectronics: Sputter Desposition to Semiconductor Manufacturing, Volume 26 (Hardcover): Stephen M. Rossnagel,...

PVD for Microelectronics: Sputter Desposition to Semiconductor Manufacturing, Volume 26 (Hardcover)

Stephen M. Rossnagel, Ronald Powell, Abraham Ulman

Series: Thin Films

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Loot Price R3,338 Discovery Miles 33 380 | Repayment Terms: R313 pm x 12*

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The progress in device technologies are surveyed in this volume. Included are Si/ (Si-Ge) heterojunctions for high-speed integrated circuits. Schottky-barrier arrays in Si and Si-Ge alloys for infrared imaging, III-V quantum-well detector structures operated in the heterodyne mode for high-data-rate communications, and III-V heterostructures and quantum-wells for infrared transmissions.

General

Imprint: Academic Press Inc
Country of origin: United States
Series: Thin Films
Release date: October 1998
Series editors: Stephen M. Rossnagel • Ronald Powell • Abraham Ulman
Dimensions: 229 x 152 x 28mm (L x W x T)
Format: Hardcover
Pages: 419
ISBN-13: 978-0-12-533026-8
Categories: Books > Science & Mathematics > Physics > States of matter > Condensed matter physics (liquids & solids)
Books > Science & Mathematics > Chemistry > Physical chemistry > Electrochemistry & magnetochemistry
Books > Professional & Technical > Mechanical engineering & materials > Materials science > General
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LSN: 0-12-533026-X
Barcode: 9780125330268

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