This multi-contributor handbook discusses Molecular Beam Epitaxy
(MBE), an epitaxial deposition technique which involves laying down
layers of materials with atomic thicknesses on to substrates. It
summarizes MBE research and application in epitaxial growth with
close discussion and a how to on processing molecular or atomic
beams that occur on a surface of a heated crystalline substrate in
a vacuum.
MBE has expanded in importance over the past thirty years (in
terms of unique authors, papers and conferences) from a pure
research domain into commercial applications (prototype device
structures and more at the advanced research stage). MBE is
important because it enables new device phenomena and facilitates
the production of multiple layered structures with extremely fine
dimensional and compositional control. The techniques can be
deployed wherever precise thin-film devices with enhanced and
unique properties for computing, optics or photonics are required.
This book covers the advances made by MBE both in research and mass
production of electronic and optoelectronic devices. It includes
new semiconductor materials, new device structures which are
commercially available, and many more which are at the advanced
research stage.
Condenses fundamental science of MBE into a modern reference,
speeding up literature reviewDiscusses new materials, novel
applications and new device structures, groundingcurrent commercial
applications with modern understanding in industry and research
Coverage of MBE as mass production epitaxial technology enhances
processing efficiency and throughput for semiconductor industry and
nanostructured semiconductor materials research community"
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