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Electromigration in Metals - Fundamentals to Nano-Interconnects (Hardcover)
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Electromigration in Metals - Fundamentals to Nano-Interconnects (Hardcover)
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Learn to assess electromigration reliability and design more
resilient chips in this comprehensive and practical resource.
Beginning with fundamental physics and building to advanced
methodologies, this book enables the reader to develop highly
reliable on-chip wiring stacks and power grids. Through a detailed
review on the role of microstructure, interfaces and processing on
electromigration reliability, as well as characterisation, testing
and analysis, the book follows the development of on-chip
interconnects from microscale to nanoscale. Practical modeling
methodologies for statistical analysis, from simple 1D
approximation to complex 3D description, can be used for
step-by-step development of reliable on-chip wiring stacks and
industrial-grade power/ground grids. This is an ideal resource for
materials scientists and reliability and chip design engineers.
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