Material synthesis by the transformation of organometallic
compounds (precursors) by vapor deposition techniques such as
chemical vapor deposition (CVD) and atomic layer deposition (ALD)
has been in the forefront of modern day research and development of
new materials. There exists a need for new routes for designing and
synthesizing new precursors as well as the application of
established molecular precursors to derive tuneable materials for
technological demands. With regard to the precursor chemistry, a
most detailed understanding of the mechanistic complexity of
materials formation from molecular precursors is very important for
further development of new processes and advanced materials. To
emphasize and stimulate research in these areas, this volume
comprises a selection of case studies covering various key-aspects
of the interplay of precursor chemistry with the process conditions
of materials formation, particularly looking at the similarities
and differences of CVD, ALD and nanoparticle synthesis, e.g.
colloid chemistry, involving tailored molecular precursors.
General
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