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Physical Design and Mask Synthesis for Directed Self-Assembly Lithography (Paperback, Softcover reprint of the original 1st ed. 2018) Loot Price: R2,873
Discovery Miles 28 730
Physical Design and Mask Synthesis for Directed Self-Assembly Lithography (Paperback, Softcover reprint of the original 1st ed....

Physical Design and Mask Synthesis for Directed Self-Assembly Lithography (Paperback, Softcover reprint of the original 1st ed. 2018)

Seongbo Shim, Youngsoo Shin

Series: NanoScience and Technology

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Loot Price R2,873 Discovery Miles 28 730 | Repayment Terms: R269 pm x 12*

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This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.

General

Imprint: Springer Nature Switzerland AG
Country of origin: Switzerland
Series: NanoScience and Technology
Release date: February 2019
First published: 2018
Authors: Seongbo Shim • Youngsoo Shin
Dimensions: 235 x 155 x 8mm (L x W x T)
Format: Paperback
Pages: 138
Edition: Softcover reprint of the original 1st ed. 2018
ISBN-13: 978-3-03-009455-3
Categories: Books > Professional & Technical > Technology: general issues > Nanotechnology
Books > Professional & Technical > Electronics & communications engineering > Electronics engineering > Circuits & components
Books > Professional & Technical > Industrial chemistry & manufacturing technologies > Other manufacturing technologies > Precision instruments manufacture > General
Books > Professional & Technical > Electronics & communications engineering > Electronics engineering > Electronic devices & materials > Semi-conductors & super-conductors
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LSN: 3-03-009455-3
Barcode: 9783030094553

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