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Books > Science & Mathematics > Physics > States of matter > Condensed matter physics (liquids & solids)

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Ultraclean Surface Processing of Silicon Wafers - Secrets of VLSI Manufacturing (Hardcover, 1998 ed.) Loot Price: R8,676

Discovery Miles 86 760

Repayment Terms: R813 pm x 12*

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Ultraclean Surface Processing of Silicon Wafers - Secrets of VLSI Manufacturing (Hardcover, 1998 ed.): Takeshi Hattori

Ultraclean Surface Processing of Silicon Wafers - Secrets of VLSI Manufacturing (Hardcover, 1998 ed.)

Takeshi Hattori; Translated by T. Hattori, S. Heusler, J.P. Webb

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Loot Price R8,676 Discovery Miles 86 760 | Repayment Terms: R813 pm x 12*

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A totally new concept for clean surface processing of Si wafers is introduced in this book. Some fifty distinguished researchers and engineers from the leading Japanese semiconductor companies, such as NEC, Hitachi, Toshiba, Sony and Panasonic as well as from several universities reveal to us for the first time the secrets of these highly productive institutions. They describe the techniques and equipment necessary for the preparation of clean high-quality semiconductor surfaces as a first step in high-yield/high-quality device production. This book thus opens the door to the manufacturing of reliable nanoscale devices and will be extremely useful for every engineer, physicist and technician involved in the production of silicon semiconductor devices.

General

Imprint:	Springer-Verlag
Country of origin:	Germany
Release date:	September 1998
First published:	1998
Editors:	Takeshi Hattori
Translators:	T. Hattori • S. Heusler • J.P. Webb
Dimensions:	216 x 140 x 39mm (L x W x T)
Format:	Hardcover
Pages:	616
Edition:	1998 ed.
ISBN-13:	978-3-540-61672-6
Categories:	Books > Science & Mathematics > Physics > States of matter > Condensed matter physics (liquids & solids) Books > Professional & Technical > Electronics & communications engineering > Electronics engineering > Electronic devices & materials > General Promotions
LSN:	3-540-61672-1
Barcode:	9783540616726