Thin-film growth is a very old art and an established scientific
field in materials science. For decades, growth of monocrystal-like
films has been practiced by making use of epitaxy on
monocrystalline substrates. In the quest for greater control of
materials, the next level of achievement will be to grow
well-oriented thin films on arbitrary substrates, i.e., without the
need for monocrystalline substrates. That is the goal of
artificially inducing grain alignment in thin films. Texturing
methods show significant promise in fabricating technologically
attractive grain-aligned films. However, over the last three
decades a variety of methods for grain alignment have been
demonstrated with varying degrees of success. The focus of this
book is on physical vapor deposition methods for growth of
inorganic thin films, with special attention paid to ion beam
assisted deposition (IBAD) texturing. Topics include: milestones in
IBAD texturing; IBAD texturing; IBAD long-length application and
texturing by other techniques.
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