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As the semiconductor industry attempts to increase the number of
functions that will fit into the smallest space on a chip, it
becomes increasingly important for new technologies to keep apace
with these demands. Photomask technology is one of the key areas to
achieving this goal. Although brief overviews of photomask
technology exist in the literature, the Handbook of Photomask
Manufacturing Technology is the first in-depth, comprehensive
treatment of existing and emerging photomask technologies
available. The Handbook of Photomask Manufacturing Technology
features contributions from 40 internationally prominent authors
from industry, academia, government, national labs, and consortia.
These authors discuss conventional masks and their supporting
technologies, as well as next-generation, non-optical technologies
such as extreme ultraviolet, electron projection, ion projection,
and x-ray lithography. The book begins with an overview of the
history of photomask development. It then demonstrates the steps
involved in designing, producing, testing, inspecting, and
repairing photomasks, following the sequences observed in actual
production. The text also includes sections on materials used as
well as modeling and simulation. Continued refinements in the
photomask-making process have ushered in the sub-wavelength era in
nanolithography. This invaluable handbook synthesizes these
refinements and provides the tools and possibilities necessary to
reach the next generation of microfabrication technologies.
State-of-the-art semiconductor lithography combines the most
advanced optical systems of our world with cleverly designed and
highly optimized photochemical materials and processes to fabricate
micro- and nanostructures that enable our modern information
society. The precise fabrication and characterization of
nanopatterns requires an in-depth understanding of all involved
physical and chemical effects. This book supports such an
understanding from a model-driven perspective, but without a heavy
mathematical emphasis. The material for the book was compiled
during many years of lecturing on optical lithography technology,
physical effects, and modeling at the
Friedrich-Alexander-University Erlangen-Nuremberg and in
preparation for dedicated courses on special aspects of
lithography. The book is intended to introduce interested students
with backgrounds in physics, optics, computational engineering,
mathematics, chemistry, material science, nanotechnology, and other
areas to the fascinating field of lithographic techniques for
nanofabrication. It should also help senior engineers and managers
expand their knowledge of alternative methods and applications.
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