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The symposium brought together more than a hundred attendees from
many countries including a significant participation from Japan and
other East-Asia countries. Many of the trends observed in the 1st
Symposium held in 1996 were confirmed: displays are indeed the main
application in LAE (photovoltaics were not included in the topics
of this symposium) and active matrix display (AMLCD) is still the
leading technology. Future AMLCDs integrating the display drivers
onto the same substrate require much faster thin-film transistors
(TFTs) than those used for LCD addressing, therefore putting a
strong demand on polysilicon performances. As a consequence the
quest for an improved low temperature, large area (and low cost)
polysilicon process is intensive and the competitors, including
direct plasma deposition and excimer laser crystallization of
amorphous layers, are reporting significant steps forward. With the
tremendous demand for efficient colour flat panel displays, other
display technologies are gaining interest. Field emission display
(FED) is one of them. FEDs based on amorphous tetrahedral carbon
thin-films are stimulating intensive studies on the optoelectronic
properties of this complex material.
Proceedings of the International Conference, held at Florence, Italy, May 9-13, 1988
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