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The SISDEP 93 conference proceedings present outstanding research
and development results in the area of numerical process and device
simulation. The miniaturization of today's semiconductor devices,
the usage of new materials and advanced process steps in the
development of new semiconductor technologies suggests the design
of new computer programs. This trend towards more complex
structures and increasingly sophisticated processes demands
advanced simulators, such as fully three-dimensional tools for
almost arbitrarily complicated geometries. With the increasing need
for better models and improved understanding of physical effects,
these proceedings support the simulation community and the process-
and device engineers who need reliable numerical simulation tools
for characterization, prediction, and development. This book covers
the following topics: process simulation and equipment modeling,
device modeling and simulation of complex structures, device
simulation and parameter extraction for circuit models, integration
of process, device and circuit simulation, practical applications
of simulation, algorithms and software.
The "Fifth International Conference on Simulation of Semiconductor
Devices and Processes" (SISDEP 93) continues a series of
conferences which was initiated in 1984 by K. Board and D. R. J.
Owen at the University College of Wales, Swansea, where it took
place a second time in 1986. Its organization was succeeded by G.
Baccarani and M. Rudan at the University of Bologna in 1988, and W.
Fichtner and D. Aemmer at the Federal Institute of Technology in
Zurich in 1991. This year the conference is held at the Technical
University of Vienna, Austria, September 7 - 9, 1993. This
conference shall provide an international forum for the
presentation of out standing research and development results in
the area of numerical process and de vice simulation. The
miniaturization of today's semiconductor devices, the usage of new
materials and advanced process steps in the development of new
semiconduc tor technologies suggests the design of new computer
programs. This trend towards more complex structures and
increasingly sophisticated processes demands advanced simulators,
such as fully three-dimensional tools for almost arbitrarily
complicated geometries. With the increasing need for better models
and improved understand ing of physical effects, the Conference on
Simulation of Semiconductor Devices and Processes brings together
the simulation community and the process- and device en gineers who
need reliable numerical simulation tools for characterization,
prediction, and development."
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