An Advanced Study Institute on solid-state imaging was held in Louvain-la-Neuve, Belgium on September 3-12, 1975 under the auspices of the Scientific Affairs Division of NATO. The Institute was organized by a scientific organizing committee consisting of Professor Paul Jespers and Professor Fernand Van de Wiele of the Universite' Catholique de Louvain and Dr. Marvin H. White of the Westinghouse Electric Corporation. This book represents the con tributions of the lecturers at the Institute and the chapters pre sert, for the first time, a concise treatment of a very timely subject, namely, solid-state imaging. The organization of the book parallels the program at the Institute with an introduction r. omprised of historical development and applications. This is f0 lowed by the physics of photosensors which leads quite naturally into the various solid-state photosensor arrays. The subject of signal extraction, which is often an overlooked area, follows and the last part of the book is devoted to the various system's con siderations. The subject matter of this book is suitable for a Wide range of interests from the advanced.student, through the practicing physcist and engineer, to the research worker. Although a novice may find some difficulty with the mathematical development, he can acquire a perspective into the field of solid-state imaging with this book. Likewise, portions of this book may be used as a text book since he chapters are instructional and self-contained."

An Advanced Study Institute on process and device modeling for integrated circuit design was held in Louvain-la-Neuve. Belgium on July 19-29. 1977 under the auspices of the Scientific Affairs Division of NATO. The Institute was organized by a scientific organizing committee consisting of Professor F. Van de Wiele of the Universite Catholique de Louvain. Professor W. L. Engl of the Technische Hochschule Aachen and Professor P. Jespers of the Universite Catholique de Louvain. This book represents the contributions of the lecturers at the Institute and the chapters present a concise treatment of a very timely subject. namely. process and device modeling for integrated circuit design. The organization of the book parallels the program at the Institute with an introd0ction .comprised of a review of mo deling and basic semiconductor physics. This is followed by the chapters devoted to basic technologies. modeling of bipolar and MoS devices. The last chapter of the book presents the specific topic of process modeling. The subject matter of this book is suitable for a wide range of interests from the advanced student. through the practisihg physicist and engineer. to the research worker. Although a novice may find some difficulty with the mathematical development. he can acquire a perspective into the field of process and device modeling for integrated circuit design with this bDOk. Likewise. portions of this book may be used as a textbook since the chap ters are intructional and self-contained."